Non-transitory computer-readable medium storing sewing data generation program, sewing data generation device and sewing method

ABSTRACT

A non-transitory computer-readable medium stores computer-readable instructions for sewing data generation. The computer-readable instructions are executed by a processor provided in a sewing data generation device. When executed by the processor in the sewing data generation device, the computer-readable instructions instruct the processor to perform following processes. First, the processor acquires a pattern. And, the processor divides the acquired pattern into a first pattern and a second pattern. The second pattern includes an overlapping portion. The overlapping portion in the second pattern partially overlaps with the first pattern. The processor generates sewing data to sew each of the first pattern and the second pattern on a sewing object. And, the processor generates processing data to process, in full size, a processing pattern. The processing pattern is obtained by excluding the overlapping portion from the second pattern, on a sheet-like processing object different from the sewing object.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a Continuation Application of InternationalApplication No. PCT/JP2016/084241, filed Nov. 18, 2016, which claimspriority from Japanese Patent Application No. 2015-254640, filed on Dec.25, 2015. This disclosure of the foregoing application is herebyincorporated by reference in its entirety.

BACKGROUND

The present disclosure relates to a non-transitory computer-readablemedium storing sewing data generation program that generates sewing datato sew a pattern using an embroidery sewing machine, to a sewing datageneration device and to a sewing method.

A sewing machine capable of embroidery sewing normally uses anembroidery frame that holds a sewing object, and performs embroiderysewing within a sewable area that is set inside the embroidery frame inaccordance with a type of the embroidery frame. In related art, a sewingmachine is known that divides an embroidery pattern larger than thesewable area into a plurality of partial patterns smaller than thesewable area, and stores sewing data corresponding to the plurality ofpartial patterns. The sewing machine sequentially sews the plurality ofpartial patterns in accordance with the sewing data, and thus sews theembroidery pattern larger than the sewable area. Every time one partialpattern of the plurality of partial patterns is sewn, a user changes aholding position of a work cloth, which is the sewing object, withrespect to the embroidery frame. The above-described sewing machineincludes an image capture portion, and before and after the holdingposition of the work cloth by the embroidery frame is changed, capturesimages of markers disposed on a surface of the work cloth. The sewingmachine extracts a plurality of feature points from the images of themarkers, and performs positioning between the plurality of partialpatterns on the basis of each of the extracted plurality of featurepoints.

In an operation in which the above-described markers are arranged, inaccordance with the already sewn partial pattern, at sewing positions ofthe other partial patterns, a specific layout of the partial pattern tobe sewn next cannot be imaged.

It is an object of the present disclosure to provide a non-transitorycomputer-readable medium storing a sewing data generation program, asewing data generation device and a sewing method that make it possibleto image a specific layout of a partial pattern to be sewn next when anembroidery pattern larger than a sewable area is sewn by being dividedinto a plurality of patterns smaller than the sewable area.

Various embodiments herein provide a non-transitory computer-readablemedium storing computer-readable instructions for sewing data generationthat are executed by a processor provided in a sewing data generationdevice. When executed by the processor, the computer-readableinstructions instruct the processor to perform processes. The processesinclude acquiring a pattern and dividing the acquired pattern into afirst pattern and a second pattern. The second pattern includes anoverlapping portion that partially overlaps with the first pattern. Theprocesses further include generating sewing data to sew each of thefirst pattern and the second pattern on a sewing object and generatingprocessing data to process, in full size, a processing pattern obtainedby excluding the overlapping portion from the second pattern, on asheet-like processing object different from the sewing object.

Various embodiments also provide a sewing data generation deviceincluding a processor and a memory. The memory stores computer-readableinstructions. When executed by the processor, the computer-readableinstructions instruct the processor to perform processes. The processesinclude acquiring a pattern and dividing the acquired pattern into afirst pattern and a second pattern. The second pattern includes anoverlapping portion that partially overlaps with the first pattern. Theprocesses further include generating sewing data to sew each of thefirst pattern and the second pattern on a sewing object and generatingprocessing data to process, in full size, a processing pattern obtainedby excluding the overlapping portion from the second pattern, on asheet-like processing object different from the sewing object.

Various embodiments also provide a sewing method including dividing apattern into a first pattern and a second pattern. The method furtherincludes generating sewing data to sew each of the first pattern and thesecond pattern on a sewing object and sewing the first pattern on thesewing object in accordance with the generated sewing data. The methodfurther includes generating print data to print the second pattern infull size on a print medium different from the sewing object andprinting the second pattern in full size on the print medium inaccordance with the generated print data. The method further includesarranging the print medium on which the second pattern has been printed,on the sewing object on which the first pattern has been sewn andadjusting a layout of the second pattern with respect to the firstpattern sewn on the sewing object. The method further includes acquiringimage data by capturing an image of the sewing object and the printmedium in a state in which the print medium is arranged on the sewingobject and correcting the sewing data to sew the second pattern, on thebasis of the acquired image data. The method further includes sewing thesecond pattern on the sewing object on which the first pattern has beensewn in accordance with the corrected sewing data.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the disclosure will be described below in detail withreference to the accompanying drawings in which:

FIG. 1 is a schematic diagram of a sewing system 30 including a sewingmachine 10, a printer 17 and a sewing data generation device 20;

FIG. 2 is an explanatory diagram of a pattern storage area 48 and amarker storage area 49;

FIG. 3 is a flowchart of main processing that is performed by the sewingdata generation device 20;

FIG. 4 is an outline drawing of a heart-shaped pattern 90;

FIG. 5 is a flowchart of sewing data generation processing that isperformed in the main processing shown in FIG. 3;

FIG. 6 is an explanatory diagram of processing that divides the pattern90 into a first pattern 91 and a second pattern 92 in accordance with asewable area 46;

FIG. 7 is a flowchart of print data generation processing that isperformed in the main processing shown in FIG. 3;

FIG. 8 is an explanatory diagram of a process to generate processingdata used to process a processing pattern 96 of the first pattern 91;

FIG. 9 is an explanatory diagram of a process to generate processingdata used to process a processing pattern 98 of the second pattern 92;

FIG. 10 is an explanatory diagram of main processing that is performedby the sewing machine 10; and

FIG. 11 is an explanatory diagram of an operation when a user specifiesa layout of the first pattern 91 and a layout of the second pattern 92using the processing patterns 96 and 98 that have been processed inaccordance with the processing data.

DETAILED DESCRIPTION OF EMBODIMENTS

An embodiment of the present disclosure will be explained with referenceto the drawings. In the present specification, image data to beprocessed by a computer is also simply referred to as an “image.” Asshown in FIG. 1, a sewing system 30 is provided with a sewing machine10, a printer 17 and a sewing data generation device 20 (hereinafterreferred to as the “device 20”). The sewing machine 10 is capable ofembroidery sewing. The printer 17 performs printing in accordance withprint data that is received via a network 16. The device 20 is awell-known personal computer (PC), and is provided with a displayportion 9, a mouse 21 and a keyboard 22.

1. Physical Configurations of Sewing Machine 10 and Embroidery Frame 45

As shown in FIG. 1, the sewing machine 10 is provided with a bed portion11, a pillar 12, an arm portion 13, a head portion 14, a movementmechanism 40 and an image sensor 35. The bed portion 11 is a baseportion of the sewing machine 10 and extends in the left-rightdirection. The pillar 12 is provided so as to extend upward from theright end portion of the bed portion 11. An LCD 15 and a touch panel 26are provided on the front surface of the pillar 12. The arm portion 13faces the bed portion 11 and extends to the left from the upper end ofthe pillar 12. The head portion 14 is a portion coupled to the leftleading end portion of the arm portion 13. Although not shown in thedrawings, the head portion 14 is provided with a needle bar, a presserbar, a needle bar up-and-down movement mechanism and the like. A sewingneedle is detachably mounted on the lower end of the needle bar.

The movement mechanism 40 is configured such that it can relatively movea sewing object C (an object to be photographed), which is held by theembroidery frame 45, with respect to the needle bar and the image sensor35 (to be described later). The movement mechanism 40 is provided with amain body case 41 and a carriage 42. When embroidery sewing isperformed, a user mounts the embroidery frame 45 on the carriage 42. Theembroidery frame 45 is moved to a needle drop point indicated by an XYcoordinate system (an embroidery coordinate system) specific to thesewing machine 10, by a Y direction movement mechanism (not shown in thedrawings) housed in the carriage 42 and an X direction movementmechanism (not shown in the drawings) housed in the main body case 41.The needle bar on which the sewing needle has been mounted and a shuttlemechanism (not shown in the drawings) are driven in accordance with themovement of the embroidery frame 45. Thus, an embroidery pattern is sewnon the sewing object C.

The image sensor 35 has a predetermined image capture range and isprovided inside the head portion 14. The image sensor 35 is, forexample, a well-known complementary metal oxide semiconductor (CMOS)image sensor. A coordinate system of an image (hereinafter also referredto as an “image coordinate system”) represented by the image datagenerated by the image sensor 35 and a coordinate system of a wholespace (hereinafter also referred to as a “world coordinate system”) areassociated with each other in advance using parameters stored in a flashmemory 64. Since the world coordinate system and the embroiderycoordinate system are associated with each other in advance using theparameters stored in the flash memory 64, the sewing machine 10 canidentify coordinates of the embroidery coordinate system on the basis ofthe image data generated by the image sensor 35.

2. Electrical Configuration of Sewing Machine 10

Electrical configurations of the sewing machine 10 and the device 20 ofthe sewing system 30 will be explained sequentially with reference toFIG. 1. The sewing machine 10 is provided with a CPU 61, a ROM 62, a RAM63, the flash memory 64, an input/output (I/O) interface 66 and acommunication I/F 67. The CPU 61 is connected to the ROM 62, the RAM 63,the flash memory 64, the I/O interface 66 and the communication I/F 67,via a bus 65. Drive circuits 71 to 74, the touch panel 26, a start/stopswitch 29, the image sensor 35 and a detector 36 are connected to theI/O interface 66. The detector 36 is configured to detect that theembroidery frame 45 has been mounted on the movement mechanism 40, andto output a detection result corresponding to a type of the embroideryframe 45.

A sewing machine motor 81 is connected to the drive circuit 71. Thedrive circuit 71 drives the sewing machine motor 81 in accordance with acontrol signal from the CPU 61. When the sewing machine motor 81 isdriven, the needle bar up-and-down movement mechanism (not shown in thedrawings) is driven via a drive shaft (not shown in the drawings) of thesewing machine 10, and the needle bar moves up and down. An X axis motor83 is connected to the drive circuit 72. A Y axis motor 84 is connectedto the drive circuit 73. The drive circuits 72 and 73 drive the X axismotor 83 and the Y axis motor 84, respectively, in accordance with acontrol signal from the CPU 61. When the X axis motor 83 and the Y axismotor 84 are driven, the embroidery frame 45 mounted on the movementmechanism 40 moves in the left-right direction (an X axis direction) andthe front-rear direction (a Y axis direction) by a movement amountcorresponding to the control signal. The drive circuit 74 causes animage to be displayed on the LCD 15 in accordance with a control signalfrom the CPU 61. The communication I/F 67 connects the sewing machine 10to the network 16. The CPU 61 can transmit and receive data to and fromanother device (for example, the device 20) connected to the network 16,via the communication I/F 67.

Operations of the sewing machine 10 will be explained briefly. When theembroidery sewing is performed using the embroidery frame 45, the needlebar up-and-down movement mechanism and the shuttle mechanism are drivenin conjunction with the embroidery frame 45 being moved in the X axisdirection and the Y axis direction by the movement mechanism 40. Thus,an embroidery pattern is sewn on the sewing object C held by theembroidery frame 45, using the sewing needle mounted on the needle bar.

3. Electrical Configuration of Device 20

As shown in FIG. 1, the device 20 is provided with a CPU 1, a ROM 2, aRAM 3, a flash memory 4, a communication I/F 5 and an input/outputinterface 8. The CPU 1 performs overall control of the device 20. TheCPU 1 is electrically connected to the ROM 2, the RAM 3, the flashmemory 4, the communication I/F 5 and the input/output interface 8, viaa bus 7. A boot program and a BIOS and the like are stored in the ROM 2.Temporary data is stored in the RAM 3. The flash memory 4 stores varioussetting values. The communication I/F 5 is an interface to connect thedevice 20 to the network 16. The CPU 1 can transmit and receive data toand from other devices (for example, the sewing machine 10 and theprinter 17) connected to the network 16, via the communication I/F 5.The input/output interface 8 is connected to the display portion 9, themouse 21 and the keyboard 22. The display portion 9 is a liquid crystaldisplay. The mouse 21 and the keyboard 22 are used to input variouscommands.

4. Storage Areas of Flash Memory 4

A pattern storage area 48 and the marker storage area 49 provided in theflash memory 4 of the device 20 will be explained with reference to FIG.2. The pattern storage area 48 stores pattern data corresponding to eachof a plurality of patterns that become candidates for the pattern to besewn by the sewing machine 10. The plurality of patterns are, forexample, a heart-shaped pattern 90 and a diamond-shaped pattern 89. Thepattern data includes sewing data. The sewing data indicates coordinatesof needle drop points to form stitches of the pattern, a sewing order,and a color of a thread to be used. The marker storage area 49 storesdata representing a marker used when sewing data generation processingis performed by the sewing system 30. An image of the marker is capturedby the sewing machine 10, and the marker includes a pattern (a graphic,a symbol or the like) whose layout (a position and an angle) can bedetected from the acquired image. In the device 20, the datarepresenting the marker is used in processing that generates processingdata representing the marker. Although not shown in the drawings, thedata representing the marker is also stored in the flash memory 64 ofthe sewing machine 10. In the sewing machine 10, the data representingthe marker is used in processing that extracts the marker from the imageacquired by the image sensor 35. The data representing the marker is,for example, image data representing the marker.

A marker 50 of the present example includes a line drawing that isdepicted using a black color in a white area surrounded by a contour 59.The contour 59 of the marker 50 has a square shape, each of whose sidesis about 2.5 cm, for example. The line drawing includes a circle 51, apoint 52 that is the center of the circle 51, a circle 53, a point 54that is the center of the circle 53, and line segments 55, 56, 57 and58. The circle 51 is depicted such that the point 52 is a central pointof the marker 50. The circle 53 is in contact with the circle 51, and isdepicted in a position where a virtual straight line (not shown in thedrawings) that passes through the point 52 and the point 54 is parallelto one side of the contour 59. The diameter of the circle 53 is smallerthan the diameter of the circle 51. The line segment 55 and the linesegment 56 overlap with the virtual straight line (not shown in thedrawings) that passes through the point 52 and the point 54, and extendrespectively from the circle 51 and the circle 53 to the contour 59. Theline segment 57 and the line segment 58 overlap with a virtual straightline (not shown in the drawings) that passes through the point 52 of thecircle 51 and that is orthogonal to the line segment 55. The linesegment 57 and the line segment 58 extend from the outer edge of thecircle 51 to the contour 59 of the marker 50.

5. Outline of Processing Performed by Sewing System 30

An outline of the sewing data generation processing that can beperformed by the sewing system 30 will be explained. In the sewingsystem 30, the device 20 can generate the sewing data of the pattern tobe sewn by the sewing machine 10. When the pattern to be sewn isselected by the user, the device 20 of the present example divides theselected pattern into a first pattern and a second pattern including anoverlapping portion that partially overlaps with the first pattern, inaccordance with a size of the selected pattern. The device 20 generatesthe sewing data to sew each of the first pattern and the second patternon the sewing object C. The device 20 generates processing data toprocess in full size a processing pattern, which is obtained byexcluding the overlapping portion from the second pattern, on asheet-like processing object different from the sewing object C. Theprocessing data of the present example is print data to print theprocessing pattern in full size on a print medium that is the sheet-likeprocessing object. The sewing machine 10 can sew the pattern inaccordance with the sewing data generated by the device 20. By aligningthe processing pattern that has been processed on the processing objectwith the first pattern that has been sewn on the sewing object, the usercan intuitively grasp the layout of the second pattern with respect tothe first pattern. The sewing machine 10 can perform the positioning ofthe second pattern with respect to the first pattern using image dataobtained by capturing an image of the processing object that has beenprocessed based on the processing data.

6. Processing Performed by Device 20

Main processing of the device 20 will be explained with reference toFIG. 3 to FIG. 9. In the main processing of the device 20, processing isperformed that generates sewing data to sew the pattern selected by theuser and print data to print the processing pattern (a printingpattern). After the user inputs commands relating to the pattern to besewn, the type of the embroidery frame to be used, and the type of theprint medium to be used for the printing of the processing pattern, themain processing is performed when the user operates the device 20 andinputs a command to activate an application to perform the mainprocessing. The pattern to be sewn is selected from among, for example,the plurality of patterns stored in the pattern storage area 48 of theflash memory 4. When the CPU 1 of the device 20 detects the command toactivate the application, the CPU 1 reads out, to the RAM 3, a sewingdata generation program to perform the main processing stored in aprogram storage area of the ROM 2. In accordance with instructionsincluded in the sewing data generation program read out to the RAM 3,the CPU 1 performs the following steps. Various parameters that arenecessary to perform the main processing are stored in the flash memory4. Various data obtained in the course of the main processing are storedin the RAM 3 as appropriate. Hereinafter, an explanation will be givenfor a case in which the heart-shaped pattern 90 in FIG. 4 is selected,as the pattern to be sewn, from among the plurality of patterns storedin the pattern storage area 48 of the flash memory 4. The pattern dataof the selected pattern includes the sewing data to perform sewing usinga predetermined stitch (for example, a fill stitch with a predeterminedthread density). The predetermined stitch may be selectable by the user.

As shown in FIG. 3, the CPU 1 acquires the heart-shaped pattern 90selected by the user from the pattern storage area 48 (step S1). Thepattern 90 is a pattern formed such that the inside of the heart-shapedcontour is sewn using a red thread and using the full stitch with thepredetermined thread density. The CPU 1 performs the sewing datageneration processing that generates the sewing data to sew the patternacquired at step S1 (step S2). As shown in FIG. 5, in the sewing datageneration processing, the CPU 1 acquires the size of a sewable area onthe basis of the type of the embroidery frame to be used specified atthe start of the main processing (step S11). The sewable area of thepresent example is a rectangular area that is set inside the embroideryframe. A relationship between the type of the embroidery frame and thesize of the sewable area is stored in advance in the flash memory 4. Therelationship between the type of the embroidery frame and the size ofthe sewable area may be set by the user. Instead of the type of theembroidery frame, the size of the sewable area may be specified when themain processing is activated. In this case, the specified size of thesewable area is acquired at step S11. In the present example, the sizeof a sewable area 46 (refer to FIG. 6) corresponding to the embroideryframe 45 is acquired.

The CPU 1 acquires the size of a print area on the basis of the type ofthe print medium (step S12). A relationship between the type of theprint medium and the size of the print area is stored in advance in theflash memory 4. The relationship between the type of the print mediumand the size of the print area may be set by the user. Instead of thetype of the print medium, the size of the print area may be specifiedwhen the main processing is activated. In this case, the specified sizeof the print area is acquired at step S12. In the present example, theprint area corresponding to an A4 size print medium that is supplied tothe printer 17 is acquired. In the present example, in order to simplifythe explanation, the explanation will be given for a case in which amargin is not set for the print medium and the size of the print mediummatches the size of the print area. In the present example, as shown inFIG. 6, the sewable area 46 is contained within a print area 47.

The CPU 1 determines whether or not the pattern acquired at step S1 iscontained within both the sewable area and the print area (step $13). Inthe present example, the sewable area 46 is contained within the printarea 47. Therefore, when the pattern 90 is contained within the sewablearea 46, it is determined that the pattern 90 is contained within boththe sewable area 46 and the print area 47. When the pattern is containedwithin both the sewable area 46 and the print area 47 (yes at step S13),the CPU 1 acquires the sewing data of the pattern acquired at step S1from the pattern storage area 48 (step S20). The CPU 1 ends the sewingdata generation processing and returns the processing to the mainprocessing in FIG. 3.

The pattern 90 of the present example is not contained within thesewable area 46 of the embroidery frame 45 (no at step S13). In thiscase, the CPU 1 divides the pattern into the first pattern and thesecond pattern including the overlapping portion that partially overlapswith the first pattern (step S14). As shown in FIG. 6, the CPU 1 dividesthe pattern 90 into a first pattern 91 and a second pattern 92 inaccordance with a known method (for example, a method described inJapanese Laid-Open Patent Publication No. 2000-24350). The first pattern91 is a pattern that is sewn when a holding position of the sewingobject C with respect to the embroidery frame 45 is a first position.The second pattern 92 is a pattern that is sewn when the holdingposition of the sewing object C with respect to the embroidery frame 45is a second position. As described below, the CPU 1 divides the pattern90 into the first pattern 91 and the second pattern 92 on the basis ofthe size of the sewable area 46. The CPU 1 sets the first position andthe second position such that a sewable area 461 when the holdingposition of the sewing object C with respect to the embroidery frame 45is the first position and a sewable area 462 when the holding positionis the second position overlap with each other by a predeterminedamount. The predetermined amount may be set in advance and is shown byarrows 95 in the present example. The CPU 1 sets the overlappingportion, in which the first pattern 91 and the second pattern 92partially overlap with each other, in a section of the pattern 90 insidea rectangular area in which the sewable area 461 and the sewable area462 overlap with each other by the predetermined amount, and divides thepattern 90 into the first pattern 91 and the second pattern 92. Thefirst pattern 91 is contained within the sewable area 461. The secondpattern 92 is contained within the sewable area 462. The first pattern91 includes an overlapping portion 93 that partially overlaps with thesecond pattern 92. The overlapping portion 93 is a section of the firstpattern 91 that is within a rectangular range having a width shown bythe arrows 95. Similarly, the second pattern 92 includes an overlappingportion 94 that partially overlaps with the first pattern 91. Theoverlapping portion 94 is a section of the second pattern 92 that iswithin the rectangular range having the width shown by the arrows 95.

The CPU 1 sets a sewing order for each of the partial patterns obtainedby dividing the pattern at step S14 (step S15). For example, the CPU 1sets the sewing order of the first pattern 91 to 1 and sets the sewingorder of the second pattern 92 to 2. The CPU 1 sets a variable N, whichis used to read out the partial patterns in accordance with the sewingorder, to 1 (step S16). The CPU 1 generates the sewing data of the N-thpartial pattern in the sewing order (step S17). The CPU 1 generates thesewing data of the N-th partial pattern in accordance with a knownmethod (for example, a method described in Japanese Laid-Open PatentPublication No. 2000-24350). In the present example, when the variable Nis 1, the sewing data is generated to sew the first pattern 91, which isthe first pattern in the sewing order, using the red thread and usingthe full stitch with the predetermined thread density. The CPU 1determines whether or not the variable N is the last in the sewing order(step S18). When the variable N is 1, it is determined that the variableN is not the last in the sewing order (no at step S18). In this case,the CPU 1 increments the variable N by 1 (step S19) and thereafterreturns the processing to step S17. When the variable N is 2, the sewingdata is generated to sew the second pattern 92, which is the secondpattern in the sewing order, using the red thread and using the fullstitch with the predetermined thread density. When the variable N is 2,it is determined that the variable N is the last in the sewing order(yes at step S18). In this case, the CPU 1 ends the sewing datageneration processing and returns the processing to FIG. 3.

As shown in FIG. 3, after the processing at step S2, the CPU 1 performsprint data generation processing that generates the print data to printa full-size processing pattern (step S3). As shown in FIG. 7, the CPU 1sets the variable N to 1 (step S31). The CPU 1 acquires the N-th patternin the sewing order (step S32). When the pattern is not divided by theprocessing at step S2, the pattern acquired at step S1 is acquired atstep S32. When the pattern is divided by the processing at step S2, theN-th partial pattern in the sewing order is acquired at step S32. TheCPU 1 generates an image of the full-size processing pattern of thepattern acquired at step S32 (step S33). The processing pattern is apattern excluding the overlapping portion that overlaps with thepreceding partial pattern in the sewing order among the plurality ofpartial patterns. When the pattern is not divided by the processing atstep S2, an image representing the pattern acquired at step S1 isgenerated at step S33. As shown by a status 1 in FIG. 8, a processingpattern 96 when the variable N is 1 matches the first pattern 91 that isthe first pattern in the sewing order. Using a known method, the CPU 1arranges the line segment representing the stitches on the image inaccordance with coordinate data. Thus, on the basis of the sewing data,the CPU 1 generates the image representing the full-size processingpattern.

The CPU 1 determines whether or not to arrange the marker 50 on theprocessing pattern 96 (step S34). Whether or not to arrange the marker50 on the processing pattern 96 may be specified by the user, forexample, or may be set in advance. When the marker 50 is not to bearranged on the processing pattern 96 (no at step S34), the CPU 1generates the print data to print the image generated at step S33 (stepS44), and performs processing at step S43 to be described later.

When the marker 50 is to be arranged on the processing pattern 96 (yesat step S34), the CPU 1 acquires data representing the marker 50 fromthe marker storage area 49 of the flash memory 4 (step S35). The CPU 1determines whether or not the marker 50 is contained within the contourof the processing pattern 96 generated at step S33 (step S36). When themarker 50 is contained within the contour of the processing pattern (noat step S36), the CPU 1 arranges the marker, with respect to theprocessing pattern, at a predetermined position where the marker doesnot overlap with the processing pattern (step S38). The predeterminedposition may be determined in advance and is, for example, a positionthat is in contact with a vertex in a predetermined direction (forexample, the upper left) of a maximum rectangle in which the processingpattern is inscribed.

In the present example, the marker 50 is contained within the contour ofthe processing pattern 96 (yes at step S36). In this case, as shown by astatus 2 in FIG. 8, the CPU 1 arranges the marker 50 acquired at stepS34 on the processing pattern 96 generated at step S33 (step S37).Subsequent to the processing at step S37 or step S38, the CPU 1 storesthe position of the processing pattern (the partial pattern) withrespect to the marker set at step S37 or step S38, in association withthe N-th pattern in the sewing order (step S39). In the present example,the position and angle of the processing pattern 96 (the first pattern91) with respect to the marker 50 are stored, as layout data, inassociation with the sewing data of the first pattern 91. The layoutdata need not necessarily include the angle of the processing pattern(the partial pattern) with respect to the marker.

The CPU 1 arranges a symbol indicating N in the sewing order, on theimage of the N-th processing pattern in the sewing order (step S40). Inthe present example, as shown by a status 3 in FIG. 8, a symbol 97,which indicates 1 in the sewing order, is arranged to the right of themarker 50. The CPU 1 arranges the image of the processing pattern 96,the marker 50 and the symbol 97 indicating the sewing order, in theprint area 47 acquired at step S12 (step S41). Specifically, as shown bya status 4 in FIG. 8, the CPU 1 sets to 0 a distance D1 (not shown inthe drawings) between a first end portion 85 that is on a first side (alower side) of the processing pattern 96, i.e., on a side on which theoverlapping portion 93 is present, and an end portion 86 on the firstside of the rectangular print area 47. The distance D1 is shorter than adistance D2 between a second end portion 87 that is on a second side (anupper side) opposite to the lower side of the processing pattern 96, andan end portion 88 on the second side of the print area 47. In otherwords, the CPU 1 causes the end portion of the processing pattern 96 onthe side on which the overlapping portion 93 is present to be placedalongside one end of the print area 47.

The CPU 1 generates the print data to print the image of the processingpattern 96, the marker 50 and the symbol 97 indicating the sewing orderin accordance with the layout set at step S41 (step S42). The CPU 1determines whether or not the variable N indicating the sewing order isthe last in the sewing order (step S43). When the variable N is not thelast in the sewing order (no at step S43), the CPU 1 increments thevariable N by 1 and returns the processing to step S32.

When the variable N is 2, the CPU 1 acquires the second pattern 92 (stepS32). As shown by a status 11 in FIG. 9, the CPU 1 generates an image ofthe full-size processing pattern 98 of the second pattern 92 acquired atstep S32 (step S33). The processing pattern 98 is a pattern obtained byexcluding the overlapping portion 94 from the second pattern 92. Whenthe marker 50 is to be arranged on the processing pattern 98 (yes atstep S34), the CPU 1 acquires the data indicating the marker 50 from themarker storage area 49 of the flash memory 4 (step S35). In the presentexample, the marker 50 is contained within the contour of the processingpattern 98 generated at step S33 (yes at step S36). In this case, asshown by a status 12 in FIG. 9, the CPU 1 arranges the marker 50acquired at step S34 on the processing pattern 98 generated at step S33(step S37). The CPU 1 stores, as the layout data, the position and angleof the processing pattern 98 (the second pattern 92) with respect to themarker 50, in association with the sewing data of the second pattern 92(step S39).

The CPU 1 arranges a symbol 99, which indicates 2 in the sewing order,on the image of the processing pattern 98 (step S40). As shown by astatus 13 in FIG. 9, the symbol 99, which indicates 2 in the sewingorder, is arranged to the right of the marker 50. The CPU 1 arranges theimage of the processing pattern 98, the marker 50 and the symbol 99indicating the sewing order, in the print area 47 acquired at step S12(step S41). Specifically, as showy by a status 14 in FIG. 9, the CPU 1sets to 0 a distance D21 (not shown in the drawings) between a first endportion 75 that is on a first side (an upper side) of the processingpattern 98, i.e. on a side in contact with the overlapping portion 94,and an end portion 76 on the first side of the rectangular print area47. The distance D21 is shorter than a distance D22 between a second endportion 77 that is on a second side (a lower side) opposite to the upperside of the processing pattern 98, and an end portion 78 on the secondside of the print area 47. The CPU 1 generates the print data to printthe image of the processing pattern 98, the marker 50 and the symbol 99indicating the sewing order in accordance with the layout set at stepS41 (step S42).

Since the variable N indicating the sewing order is 2, it is determinedthat the sewing order is the last in the sewing order (yes at step S43),and the CPU 1 determines whether or not a printing start command hasbeen acquired (step S45). The CPU 1 stands by until the printing startcommand is acquired (no at step S45). The user operates the mouse 21 orthe keyboard 22 to input the printing start command. When the printingstart command has been acquired (yes at step S45), the CPU 1 outputs, tothe printer 17, the print data generated by the processing at step S42or step S44 and performs the printing (step S47). The CPU 1 ends theprint data generation processing, returns the processing to step S3, andends the main processing.

The main processing that is performed by the sewing machine 10 will beexplained with reference to FIG. 10 and FIG. 11, using theabove-described example. In the main processing, the processing isperformed to sew the pattern in accordance with the sewing datagenerated by the device 20. The sewing data generated by the device 20is transmitted to the sewing machine 10 via the network 16, for example.In the sewing system 30 of the present example, in addition to thesewing data, the layout data indicating the position and angle of thepattern with respect to the marker 50 is transmitted to the sewingmachine 10. The sewing data and the layout data generated by the device20 may be stored in a storage medium, such as a memory card, forexample, and may be acquired by the sewing machine 10. The mainprocessing is activated when the pattern of the sewing data generated bythe device 20 is selected as the pattern to be sewn. When the CPU 61detects a command to activate the main processing, the CPU 61 reads out,to the RAM 63, a program to execute the main processing stored in aprogram storage area of the ROM 62. In accordance with instructionsincluded in the program read out to the RAM 63, the CPU 61 performs thefollowing steps. Various parameters that are necessary to perform themain processing are stored in the flash memory 64. Various data obtainedin the course of the main processing are stored in the RAM 63 asappropriate.

As shown in FIG. 10, the CPU 61 sets the variable N to 1 (step S51). TheCPU 61 acquires embroidery data to sew the N-th pattern in the sewingorder (step S52). The embroidery data includes the sewing data and thelayout data. The embroidery data may include the image data representingthe pattern. The CPU 61 determines whether or not the mode is an imagemode (step 53). The image mode is a mode in which the positioning of thepattern is performed on the basis of the image captured by the imagesensor 35.

When the mode is not the image mode (no at step S53), the CPU 61 standsby until the layout of the N-th pattern is specified via the touch panel26 (no at step S60). The user operates the touch panel 26 and specifiesthe layout of the N-th pattern. When the layout is specified (yes atstep S60), the CPU 61 acquires the specified layout (step S61), andcorrects the sewing data included in the embroidery data acquired atstep S52, on the basis of the acquired layout and in accordance with aknown method (refer to Japanese Laid-Open Patent Publication No.2010-246885, for example) (step S62). After that, the CPU 61 performsprocessing at step S63 to be described later.

When the mode is the image mode (yes at step S53), the CPU 61 causes theLCD 15 to display a message that prompts the user to arrange a printmedium P1, on which the processing pattern 96 has been printed, on thesewing object C after attaching to the carriage 42 the embroidery frame45 that is holding the sewing object C, and to input an image capturecommand (step S54). The CPU 61 stands by until the image capture commandis input (no at step S55). Referring to the message displayed on the LCD15, the user causes the sewing object C to be held by the embroideryframe 45 such that the holding position of the sewing object C withrespect to the embroidery frame 45 is the first position, and attachesthe embroidery frame 45 to the carriage 42. As shown in the uppersection of FIG. 11, the user arranges the print medium P1, on which theprocessing pattern 96 has been printed, on the sewing object C. Afterthe user verifies an image of the finished embroidery of the firstpattern 91 with respect to the sewing object C, using the print mediumP1, the user inputs the image capture command. When the image capturecommand is acquired (yes at step S55), the CPU 61 causes the imagesensor 35 to capture an image of a predetermined area, and thus acquiresthe image data generated by the image capture (step S56). Thepredetermined area may be determined in advance or may be specified bythe user. The CPU 61 may identify the predetermined area on the basis ofthe embroidery data.

On the basis of the embroidery data acquired at step S52, the CPU 61determines whether or not to perform the positioning using the marker 50(step S57). The CPU 61 of the present example determines whether or notto perform the positioning using the marker 50, on the basis of whetheror not the layout data is included in the embroidery data acquired atstep S52. Specifically, when the layout data is included in theembroidery data acquired at step S52, the CPU 61 determines that thepositioning of the first pattern 91 is to be performed using the marker50 (yes at step S57). In this case, the CPU 61 processes the image dataacquired at step S56, detects the marker 50 from the image, andidentifies the position and angle of the detected marker 50 in theembroidery coordinate system (step S58). When the layout data is notincluded in the embroidery data acquired at step S52, the CPU 61determines that the positioning is not to be performed using the marker50 (no at step S57). In this case, the CPU 61 processes the image dataacquired at step S56, detects the processing pattern from the image, andidentifies the position and angle of the detected processing pattern(step S59). The processing that identifies the position and angle of thedetected processing pattern is performed using known pattern matchingthat compares the image representing the pattern based on the embroiderydata and the image represented by the image data acquired at step S56.Known image processing technologies include, for example, Oriented FASTand Rotated BRIEF (ORB), Scale Invariant Feature Transform (SIFT),Speeded-Up Robust Features (SURF) and the like. Since these algorismsare well known, a detailed explanation thereof is omitted here.

The CPU 61 corrects the sewing data included in the embroidery dataacquired at step S52, in accordance with detection results at step S58and step S59 (step S62). Specifically, when the positioning of the firstpattern 91 is to be performed using the marker 50, the CPU 61 identifiesthe layout of the pattern with respect to the marker 50 identified atstep S58, on the basis of the position and angle of the marker 50identified at step S58 and the position and angle of the pattern withrespect to the marker 50. The position and angle of the pattern withrespect to the marker 50 are indicated by the layout data included inthe embroidery data acquired at step S52. The CPU 61 corrects the sewingdata so that the N-th pattern in the sewing order is sewn in accordancewith the identified layout. Meanwhile, when the positioning is not to beperformed using the marker 50, the CPU 61 corrects the sewing data sothat the N-th pattern is sewn at the identified position and angle, onthe basis of the position and angle of the image of the processingpattern identified at step S59. The CPU 61 causes the LCD 15 to displaya message that prompts the user to input a sewing start command (stepS63), and stands by until the sewing start command is acquired (no atstep S64). After verifying the message on the LCD 15, the user removesthe print medium arranged on the sewing object C and inputs the sewingstart command. When the sewing start command is acquired (yes at stepS64), the CPU 61 causes the N-th pattern to be sewn in accordance withthe sewing data corrected at step S62 (step S65).

The CPU 61 determines whether or not the variable N is the last in thesewing order (step S66). The CPU 61 determines that 1, which is thevariable N, is not the last in the sewing order (no at step S66), andincrements the variable N by 1 (step S67). After that, the CPU 61displays a message that prompts the user to change the holding positionof the sewing object C with respect to the embroidery frame 45 (stepS68). In accordance with the message displayed at step S68, the userchanges the holding position of the sewing object C with respect to theembroidery frame 45 from the first position to the second position. Theuser attaches, to the carriage 42, the embroidery frame 45 that isholding the sewing object C whose holding position has been changed.Subsequent to the processing at step S68, the CPU 61 returns theprocessing to step S52.

When the variable N is 2, in accordance with the message displayed atstep S54, the user arranges a print medium P2, on which the processingpattern 98 has been printed, on the sewing object C, as shown in thelower section of FIG. 11. The user adjusts the position of the printmedium P2 with respect to the first pattern 91 that has already beensewn, and thus adjusts the layout of the processing pattern 98 withrespect to the first pattern 91. The user verifies the layout of theprocessing pattern 98 with respect to the first pattern 91 by referringto the print medium P2, and thereafter inputs the image capture command.When the image capture command is acquired (yes at step S55), the CPU 61causes the image sensor 35 to perform image capture, and acquires theimage data generated by the image capture (step S56).

On the basis of the embroidery data acquired at step S52, the CPU 61determines that the positioning is to be performed using the marker 50(yes at step S57). The CPU 61 processes the image data acquired at stepS56, detects the marker 50 from the image, and identifies the positionand angle of the detected marker 50 in the embroidery coordinate system(step S58). The CPU 61 corrects the sewing data included in theembroidery data acquired at step S52, in accordance with a detectionresult at step S58 and the layout data of the N-th pattern (step S62).The CPU 61 causes the LCD 15 to display the message that prompts theuser to input the sewing start command (step S63), and stands by untilthe sewing start command is acquired (no at step S64). After verifyingthe message on the LCD 15, the user removes the print medium P2 arrangedon the sewing object C and inputs the sewing start command. When thesewing start command is acquired (yes at step S64), the CPU 61 causesthe second pattern 92 to be sewn in accordance with the sewing datacorrected at step S62 (step S65). Since the variable N is 2, it isdetermined that the variable N is the last in the sewing order (yes atstep S66), and the CPU 61 ends the main processing.

The device 20 can generate the processing data representing thefull-size processing pattern. The processing includes, for example,printing, drawing and cutting. The device 20 of the present examplegenerates, as the processing data, the print data to print theprocessing pattern in full size on the print medium, which is thesheet-like processing object. The processing pattern 98 when thevariable N is 2 is a pattern obtained by excluding the overlappingportion 94 from the second pattern 92. Therefore, as shown in the lowersection of FIG. 11, the user arranges the processing pattern 98 printedon the print medium P2 on the sewing object C such that the processingpattern 98 is aligned with the already sewn first pattern 91. Thus, theuser can intuitively grasp the layout of the second pattern 92 withrespect to the first pattern 91.

The device 20 arranges the marker 50, which is used as a reference forthe layout of the second pattern 92, with respect to the processingpattern 98, and sets the layout of the second pattern 92 represented bythe sewing data with respect to the marker 50. The device 20 generatesthe processing data to process the full-size processing pattern 98 andthe marker 50 arranged with respect to the processing pattern 98. Thus,with the device 20, it is possible to generate the processing data toprocess the processing pattern 98 and the marker 50, which is used asthe reference for the layout of the second pattern 92. In the sewingmachine 10, an image of the processing pattern 98 processed on thesewing object (the print medium P2) is captured in a state in which theprocessing pattern 98 is aligned with the already sewn first pattern 91.Thus, the user can cause the sewing machine 10 to perform the processingthat sets the layout of the second pattern 92 with respect to the firstpattern 91.

The device 20 arranges the image representing the marker 50 on theprocessing pattern 98 so as to overlap with the processing pattern 98.The device 20 can generate the processing data such that the imagerepresenting the marker 50 overlaps with the processing pattern 98. Byjoining the processing pattern 98 printed on the print medium P2 withthe already sewn first pattern 91, the user can intuitively grasp thelayout of the second pattern 92 with respect to the first pattern 91without worrying about the layout of the marker 50. Even when theprocessing pattern is cut out along the contour, the user can make therelative position of the processing pattern with respect to the marker50 constant. When the user sews the pattern 90 using the sewing machine10 that can capture the image of the marker 50 and perform thepositioning, the user causes the image of the processing pattern 98 thathas been processed to be captured in the state in which the processingpattern 98 is aligned with the already sewn first pattern 91. Byinputting the image capture command, the user can cause the sewingmachine 10 to perform the processing that sets the layout of the secondpattern 92 with respect to the first pattern 91. When the processingobject is processed in accordance with the processing data, it ispossible to reduce the printing space of the print medium P2 incomparison to when the processing pattern 98 and the marker 50 arearranged in separate areas.

The device 20 determines whether the image representing the marker 50can be arranged on the processing pattern so as to overlap with theprocessing pattern. When it is determined that the image representingthe marker 50 cannot be arranged on the processing pattern so as tooverlap with the processing pattern, the device 20 arranges the marker50, with respect to the processing pattern, at the predeterminedposition where the marker 50 does not overlap with the processingpattern. When the image representing the marker 50 cannot be arranged onthe processing pattern so as to overlap with the processing pattern, thedevice 20 can generate the processing data such that the marker 50 isarranged at the predetermined position with respect to the processingpattern.

The device 20 acquires the size of the sewable area 46 that is setinside the embroidery frame 45 (step S11). On the basis of the acquiredsize of the sewable area 46, the pattern 90 acquired at step S1 isdivided into the first pattern 91 and the second pattern 92 having asize that is contained within the sewable area 46 (step S14). When thepattern 90 larger than the sewable area 46 is to be sewn, the device 20can automatically divide the pattern 90 into the partial patterns havinga size that is reliably contained within the sewable area 46. The device20 can eliminate a user operation to specify dividing positions, whichis troublesome.

The CPU 1 acquires the size of the processing area (the print area) thatis set on the sewing object (the print medium) (step S12). On the basisof the acquired sizes of the sewable area 46 and the processing area(the print area 47), the CPU 1 divides the pattern 90 acquired at stepS1 into the first pattern 91 and the second pattern 92 having a sizethat is contained within both the sewable area 46 and the processingarea (the print area 47) (step S14). When the printing is performed inaccordance with the print data generated by the device 20, each of theprocessing pattern 96 of the first pattern 91 and the processing pattern98 of the second pattern 92 is contained on a single sheet of the printmedium. In comparison to when one processing pattern is divided andprinted on a plurality of sheets of the print medium, the device 20 canimprove user-friendliness when the user verifies the finished sewing ofthe pattern using the printed processing pattern.

The device 20 divides the acquired pattern into a plurality of partialpatterns including the first pattern and the second pattern. The partialpatters that are adjacent to each other include an overlapping portionin which they partially overlap with each other. The device 20 sets thesewing order of the plurality of partial patterns and generates thesewing data to sew each of the partial patterns. The device 20 generatesthe processing data to process the processing pattern excluding theoverlapping portion that overlaps with the preceding partial pattern inthe sewing order among the plurality of partial patterns, in full sizefor each of the partial patterns. With respect to the first pattern 91,the device 20 can generate the processing data to process, in full size,the processing pattern including the overlapping portion 93. Withrespect to the second pattern 92, the device 20 can generate theprocessing data to process, in full size, the processing patternexcluding the overlapping portion 94.

The device 20 generates the processing data to process the processingpattern excluding the overlapping portion that overlaps with thepreceding partial pattern in the sewing order among the plurality ofpartial patterns, and the symbol indicating the sewing order, in fullsize for each of the partial patterns. When the processing object isprocessed in accordance with the generated processing data, the device20 can process the processing object such that the correspondencebetween the sewing order and the partial patterns can be grasped. Theuser can easily grasp the sewing order of the partial patterns bylooking at the processing object.

The device 20 sets the distance D21 between the first end portion 75 ofthe processing pattern 98 on the first side (the upper side of FIG. 9),which is in contact with the overlapping portion 94, and the end portion76 on the first side of the rectangular processing area to be shorterthan the distance D22. The distance D22 is the distance between thesecond end portion 77 of the processing pattern 98 on the second sideopposite to the first side, and the end portion 78 on the second side ofthe processing area. Therefore, when the device 20 processes theprocessing object in accordance with the generated processing data, theuser can easily arrange the processing object with respect to thealready sewn partial pattern, in comparison to when the processingpattern is not arranged nearer to the first side with respect to theprocessing object. With the device 20 of the present example, the firstend portion 75 is a straight line and the distance D21 is 0. Therefore,as shown in the lower section of FIG. 11, the user can easily performpositioning with respect to the sewing object C on which the firstpattern 91 has been sewn, without performing processing, such as cuttingthe print medium P2 along the pattern.

The non-transitory computer-readable medium storing the sewing datageneration program, the sewing data generation device and the sewingmethod of the present disclosure are not limited to the above describedembodiment, and various changes may be made without departing from thespirit and scope of the present disclosure. For example, the followingmodifications (A) to (C) may be added as appropriate.

(A) The configuration of the device 20 may be changed as appropriate.The device 20 may be a dedicated device or may be a mobile terminaldevice, such as a smart phone, a tablet PC or the like. The device 20may be provided in the sewing machine 10. As long as the sewing machine10 is capable of embroidery sewing, it may be an industrial sewingmachine or a multi-needle sewing machine.

(B) The program including the instructions to cause the main processing(refer to FIG. 3), which is performed by the device 20, to be executedmay be stored in a storage device of the device 20 until the CPU 1executes the program. Therefore, an acquisition method of the program,an acquisition route, and the device that stores the program may each bechanged as appropriate. The program to be executed by the CPU 1 may bereceived from another device via a cable or wireless communication, andmay be stored in a storage device, such as a flash memory. Examples ofthe other device include a PC and a server connected via a network.

(C) The respective steps of the main processing (refer to FIG. 3)performed by the device 20 are not limited to the example in which theyare performed by the CPU 1, and a part or all of the steps may beperformed by another electronic device (an ASIC, for example). Therespective steps of the main processing may be performed throughdistributed processing by a plurality of electronic devices (a pluralityof CPUs, for example). The respective steps of the main processing canbe changed in order, omitted or added, as necessary. An aspect in whichan operating system (OS) or the like operating on the device 20 performsa part or all of the main processing on the basis of a command from theCPU 1 is also included in the scope of the present disclosure. Forexample, the following modifications from (C-1) to (C-6) may be added tothe main processing, as appropriate.

(C-1) At step S42, instead of the print data, the CPU 1 may generate theprocessing data to process the processing pattern in full size on asheet-like processing object different from the sewing object C. Theprocessing data is, for example, cutting data and drawing data that areused in a known cutting device (refer to Japanese Laid-Open PatentPublication No. 2014-124748, for example). The cutting device cuts asheet-like processing object other than the sewing object C inaccordance with the cutting data. The cutting device uses a writingtool, such as a pen, to draw on the sheet-like processing object otherthan the sewing object C in accordance with the drawing data. When thecutting data is used as the processing data, the CPU 1 may generate thecutting data to cut along the contour of the processing pattern. Inaddition to the cutting data to cut along the contour of the processingpattern, the CPU 1 may generate the cutting data to cut the line drawingof the marker arranged inside the contour of the processing pattern andto cut the symbol indicating the sewing order.

(C-2) The device 20 need not necessarily arrange the marker with respectto the processing pattern. When the marker is arranged with respect tothe processing pattern, the device 20 need not necessarily arrange themarker on the processing pattern so as to overlap with the processingpattern. The device 20 may omit the processing (step S36) thatdetermines whether or not the marker is contained within the contour ofthe processing pattern. In this case, the device 20 may arrange themarker at a predetermined position with respect to the processingpattern. For example, the device 20 may match the center of a minimumrectangle that encompasses the processing pattern with the center of themarker. The design and size of the marker may be changed as appropriate.The device 20 need not necessarily generate the processing data for thefirst pattern 91. When the processing data is generated for the firstpattern 91, the device 20 may use, as the processing pattern, a patternobtained by excluding the overlapping portion 93 from the first pattern91. The device 20 may generate the processing data to process aplurality of processing patterns on the same processing object whiletaking into account the size of the processing patterns and the size ofthe processing area. For example, the device 20 may generate the printdata to print the processing pattern 96 and the processing pattern 98 onthe same print medium. While taking into account the size of theprocessing pattern and the size of the processing area, the device 20may generate the processing data to process a single processing patternon a plurality of processing objects in a dispersed manner. For example,the device 20 may generate the print data to print the left half of theprocessing pattern 96 and the right half of the processing pattern 96 onseparate print media.

(C-3) The device 20 may divide the pattern into three or more partialpatterns. When the device 20 divides the pattern into the first pattern,the second pattern and a third pattern in the sewing order, it ispreferable that the processing pattern of the second pattern be apattern obtained by excluding the overlapping portion of the secondpattern and the first pattern from the second pattern. When the thirdpattern has overlapping portions that respectively overlap with thefirst pattern and the second pattern, it is preferable that theprocessing pattern of the third pattern be a pattern obtained byexcluding, from the third pattern, the overlapping portion of the thirdpattern and the first pattern and the overlapping portion of the thirdpattern and the second pattern. When the device 20 divides the patterninto the first pattern, the second pattern and the third pattern in thesewing order, the processing pattern of the second pattern may be apattern obtained by excluding, from the second pattern, an overlappingportion of the second pattern and the other partial patterns. Theprocessing pattern of the third pattern may be a pattern obtained byexcluding, from the third pattern, one of the overlapping portion of thethird pattern and the first pattern and the overlapping portion of thethird pattern and the second pattern.

(C-4) The device 20 need not necessarily divide the pattern on the basisof the size of the sewable area and the size of the processing area. Thedevice 20 may divide the pattern on the basis of one of the size of thesewable area and the size of the processing area. When the device 20divides the pattern into partial patterns having the same size as thesewable area, there is a case in which it becomes difficult to set theholding position of the sewing object C with respect to the embroideryframe. In consideration of this case, the device 20 may divide thepattern on the basis of an area obtained by narrowing the sewable areaby an amount that is determined while taking into account a settingaccuracy of the holding position of the sewing object with respect tothe embroidery frame.

(C-5) When the device 20 divides the pattern into a plurality of partialpatterns, the device 20 need not necessarily set the sewing order ofeach of the partial patterns. The method for setting the sewing ordermay be determined in advance. The sewing order may be specified by theuser. The device 20 need not necessarily generate the data to processthe symbol indicating the sewing order. The symbol indicating the sewingorder is not limited to a numeric character and may be another characteror graphic. The layout of the symbol indicating the sewing order withrespect to the processing pattern may be changed as appropriate. Forexample, with respect to the symbol indicating the sewing order, thedevice may determine whether or not the symbol is contained within theprocessing pattern in a similar manner to the processing at step S36.When it is determined that the symbol is not contained within theprocessing pattern, the device 20 may arrange the symbol at apredetermined position with respect to the processing pattern. When itis determined that the symbol is contained within the processingpattern, the device 20 may arrange the symbol on the processing pattern.The device 20 may set the layout of the processing pattern with respectto the processing area at an arbitrary position. For example, the device20 may set a distance D31 between the first end portion on the firstside of the processing pattern, which comes into contact with theoverlapping portion, and the end portion on the first side of therectangular processing area to be shorter than a distance D32 betweenthe second end portion of the processing pattern on the second sideopposite to the first side and the end portion on the second side of theprocessing area. In this case, the distance D31 need not necessarily be0. The device 20 may set the layout of the processing pattern withrespect to the processing area, without taking into account therelationship between the distance D31 and the distance D32.

(C-6) In the main processing, when the printing is not performedimmediately on the basis of the print data generated at step S42, thegenerated print data may be temporarily stored. The sewing data need notnecessarily be set in advance for the pattern acquired at step S1. Forexample, the pattern may be a line drawing input by the user. In thiscase, the device 20 may generate the sewing data by converting the linedrawing to a predetermined stitch (for example, a fill stitch, a satinstitch or the like).

What is claimed is:
 1. A non-transitory computer-readable medium storingcomputer-readable instructions for sewing data generation that areexecuted by a processor provided in a sewing data generation device, thecomputer-readable instructions, when executed by the processor,instructing the processor to perform processes comprising: acquiring apattern; dividing the acquired pattern into a first pattern and a secondpattern, the second pattern including an overlapping portion thatpartially overlaps with the first pattern; generating sewing data to seweach of the first pattern and the second pattern on a sewing object; andgenerating processing data to process, in full size, a processingpattern obtained by excluding the overlapping portion from the secondpattern, on a sheet-like processing object different from the sewingobject.
 2. The non-transitory computer-readable medium according toclaim 1, wherein the generating of the processing data includesgenerating print data to print the processing pattern in full size on aprint medium, which is the sheet-like processing object.
 3. Thenon-transitory computer-readable medium according to claim 1, whereinthe computer-readable instructions further instruct the processor toperform processes comprising: arranging a marker, which is used as areference for a layout of the second pattern, with respect to theprocessing pattern, and setting the layout of the second patternrepresented by the sewing data with respect to the marker, wherein thegenerating of the processing data includes generating the processingdata to process the full-size processing pattern and the marker arrangedwith respect to the processing pattern.
 4. The non-transitorycomputer-readable medium according to claim 3, wherein the setting ofthe layout includes arranging an image representing the marker on theprocessing pattern so as to overlap with the processing pattern.
 5. Thenon-transitory computer-readable medium according to claim 4, whereinthe computer-readable instructions further instruct the processor toperform a process comprising: determining whether the image representingthe marker is able to be arranged on the processing pattern so as tooverlap with the processing pattern, wherein the setting of the layoutincludes arranging the marker, with respect to the processing pattern,at a predetermined position where the marker does not overlap with theprocessing pattern, when it is determined that the image representingthe marker is not able to be arranged on the processing pattern so as tooverlap with the processing pattern.
 6. The non-transitorycomputer-readable medium according to claim 1, wherein thecomputer-readable instructions further instruct the processor to performa process comprising: acquiring a size of a sewable area that is setinside an embroidery frame, wherein the dividing of the pattern includesdividing the acquired pattern into the first pattern and the secondpattern having a size that is contained within the sewable area, on thebasis of the acquired size of the sewable area
 7. The non-transitorycomputer-readable medium according to claim 6, wherein thecomputer-readable instructions further instruct the processor to performa process comprising: acquiring a size of a processing area that is seton the processing object, wherein the dividing of the pattern includesdividing the acquired pattern into the first pattern and the secondpattern having a size that is contained within both the sewable area andthe processing area, on the basis of the acquired size of the sewablearea and the acquired size of the processing area.
 8. The non-transitorycomputer-readable medium according to claim 1, wherein the dividing ofthe pattern includes dividing the acquired pattern into a plurality ofpartial patterns, the plurality of partial patterns including the firstpattern and the second pattern and including the overlapping portion inwhich the adjacent partial patterns partially overlap with each other,the generating of the sewing data includes setting a sewing order of theplurality of partial patterns and generating the sewing data to sew eachof the plurality of partial patterns, and the generating of theprocessing data includes generating the processing data to process aprocessing pattern obtained by excluding the overlapping portion thatoverlaps with the preceding partial pattern in the sewing order amongthe plurality of partial patterns, in full size for each of theplurality of partial patterns.
 9. The non-transitory computer-readablemedium according to claim 8, wherein the generating of the processingdata includes generating the processing data to process the processingpattern obtained by excluding the overlapping portion that overlaps withthe preceding partial pattern in the sewing order among the plurality ofpartial patterns, and a symbol indicating the sewing order, in full sizefor each of the plurality of partial patterns.
 10. The non-transitorycomputer-readable medium according to claim 7, wherein the generating ofthe processing data includes generating the processing data in which adistance between a first end portion on a first side of the processingpattern and an end portion on the first side of the processing areahaving a rectangular shape is set to be shorter than a distance betweena second end portion on a second side of the processing pattern and anend portion on the second side of the processing area, the first sidebeing a side in contact with the overlapping portion of the processingpattern, and the second side being an opposite side to the first side.11. A sewing data generation device comprising: a processor; and amemory storing computer-readable instructions, when executed by theprocessor, instructing the processor to perform processes comprising:acquiring a pattern; dividing the acquired pattern into a first patternand a second pattern, the second pattern including an overlappingportion that partially overlaps with the first pattern; generatingsewing data to sew each of the first pattern and the second pattern on asewing object; and generating processing data to process, in full size,a processing pattern obtained by excluding the overlapping portion fromthe second pattern, on a sheet-like processing object different from thesewing object.
 12. A sewing method comprising: dividing a pattern into afirst pattern and a second pattern; generating sewing data to sew eachof the first pattern and the second pattern on a sewing object; sewingthe first pattern on the sewing object in accordance with the generatedsewing data; generating print data to print the second pattern in fullsize on a print medium different from the sewing object; printing thesecond pattern in full size on the print medium in accordance with thegenerated print data; arranging the print medium on which the secondpattern has been printed, on the sewing object on which the firstpattern has been sewn; adjusting a layout of the second pattern withrespect to the first pattern sewn on the sewing object; acquiring imagedata by capturing an image of the sewing object and the print medium ina state in which the print medium is arranged on the sewing object;correcting the sewing data to sew the second pattern, on the basis ofthe acquired image data; and sewing the second pattern on the sewingobject on which the first pattern has been sewn in accordance with thecorrected sewing data.